Clean Room Laboratory

Located in the basement of the METU Department of Physics, the facility comprises four sections with a total laboratory area of 150 m². The main area houses equipment for crystalline silicon and silicon-based thin-film fabrication. Dedicated spaces are available for wet-chemical processing and optical lithography.

The former cleanroom facility is divided into four separate work areas to isolate different fabrication stages. The largest section, which serves as the main production area, contains annealing furnaces for extended thermal processing and PVD coating systems for thin-film deposition. The second large area is configured for metal-printing applications involving rapid thermal processing and patterning. Of the two remaining independent sections, one is used for metal evaporation processes, while the other houses wet-bench infrastructure for the safe execution of chemical procedures.

Construction of a new cleanroom facility covering approximately 600 m² within the Research Park began in 2025, with commissioning targeted for 2026. The new cleanroom will include ISO Class 1,000, 10,000, and 100,000 areas.